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Oxygen-activated growth and bandgap tunability of large single-crystal bilayer graphene

机译:大型单晶双层石墨烯的氧激活生长和带隙可调性

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摘要

Bernal (AB)-stacked bilayer graphene (BLG) is a semiconductor whose bandgap can be tuned by a transverse electric field, making it a unique material for a number of electronic and photonic devices. A scalable approach to synthesize high-quality BLG is therefore critical, which requires minimal crystalline defects in both graphene layers and maximal area of Bernal stacking, which is necessary for bandgap tunability. Here we demonstrate that in an oxygen-activated chemical vapour deposition (CVD) process, half-millimetre size, Bernal-stacked BLG single crystals can be synthesized on Cu. Besides the traditional surface-limited growth mechanism for SLG (1st layer), we discovered new microscopic steps governing the growth of the 2nd graphene layer below the 1st layer as the diffusion of carbon atoms through the Cu bulk after complete dehydrogenation of hydrocarbon molecules on the Cu surface, which does not occur in the absence of oxygen. Moreover, we found that the efficient diffusion of the carbon atoms present at the interface between Cu and the 1st graphene layer further facilitates growth of large domains of the 2nd layer. The CVD BLG has superior electrical quality, with a device on/off ratio greater than 10 4, and a tunable bandgap up to ∼100meV at a displacement field of 0.9Vnm-1.
机译:Bernal(AB)堆叠的双层石墨烯(BLG)是一种半导体,其带隙可以通过横向电场进行调节,从而使其成为许多电子和光子器件的独特材料。因此,合成高质量BLG的可扩展方法至关重要,它要求石墨烯层中的晶体缺陷最少,而Bernal堆叠的面积最大,这对于带隙可调性是必需的。在这里,我们证明了在氧激活化学气相沉积(CVD)过程中,可以在Cu上合成半毫米大小的Bernal堆叠BLG单晶。除了SLG(第一层)的传统表面受限生长机制外,我们发现了新的微观步骤,可控制第一层以下第二石墨烯层的生长,因为碳原子在碳氢化合物上完全脱氢后,碳原子通过Cu主体扩散。铜表面,在没有氧气的情况下不会发生。此外,我们发现存在于Cu和第一石墨烯层之间的界面处的碳原子的有效扩散进一步促进了第二层的大畴的生长。 CVD BLG具有卓越的电气质量,器件的开/关比大于10 4,并且在0.9Vnm-1的位移场上具有高达〜100meV的可调带隙。

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